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As the field of ALD continues to grow, scientists and engineers are exploring new ways of utilizing its capabilities. One potential area is in the development of advanced materials with tailored properties for specific applications. For instance, by using a combination of ALD and other deposition techniques such as molecular beam epitaxy (MBE) or chemical vapor deposition (CVD), researchers can create complex structures with precise control over their composition and morphology.
Another area of interest is in the development of ALD-enabled manufacturing processes that can produce high-quality thin films at a large scale and low cost. This could be achieved through the use of roll-to-roll processing, which enables continuous deposition of thin films on flexible substrates.
Furthermore, there is also growing interest in using ALD for developing novel materials and devices at the nanoscale level. This includes the fabrication of nanowires, nanotubes, and other nanostructures for various applications, including sensing, energy conversion, and biomedical devices.
In summary, Atomic Layer Deposition has emerged as a powerful technique for precisely controlling the growth and properties of thin films at the atomic level. The ability to tailor these properties opens up a wide range of opportunities for developing novel materials and devices for various applications. As the demand for high-performance materials and devices continues to grow, ALD is expected to play an increasingly important role in material engineering and device fabrication.